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25th Annual Lee Hakel Industrial-Organizational Psychology Doctoral Consortium

Larry J. Williams
Wayne State University

The 25th Annual Lee Hakel SIOP Doctoral Consortium will be held on Wednesday, April 7, 2010 at the Hilton Atlanta hotel, preceding the annual SIOP conference, which begins April 8.  The consortium will include an impressive lineup of speakers chosen for their outstanding contributions to the field. Presenters at the consortium will include academic and practitioner experts who can offer unique perspectives on the opportunities and challenges faced by I-O psychologists today, as well as the key developmental experiences that can lay the groundwork for a successful career in industrial and organizational psychology.  

In January 2010, each doctoral program will be sent registration materials for the consortium. Enrollment is limited to one student per program, up to a maximum of 40 participants.  We encourage faculty to make student nominations as soon as registration materials arrive because students are enrolled in the order that completed applications are received. The fee for participants is $70.

The consortium is designed for upper level graduate students nearing completion of their doctorates.  Most participants will be graduate students in I-O psychology and OB/HRM doctoral programs, generally third- or fourth-year students who have completed most or all course work and are working on their dissertations. Preference will be given to nominees who meet these criteria and have not attended the consortium in previous years. For additional information on the 2010 consortium, please contact Dr. Larry Williams at carma@wayne.edu. We look forward to another successful doctoral consortium in 2010!